Asia Pacific Chevron Reliability Maintenance Conference


    What is Chevron Reliability Maintenance Conference?

    The Asia Pacific edition of Chevron Reliability Maintenance Conference is the premier technical summit for the heavy duty equipment industries, including mining, construction, quarry and cement. 

    The 2019 AP RMC will be held in Kuala Lumpur, Malaysia on 16 & 17 October 2019.

    You will have the opportunity to learn from industry experts who will share cutting edge strategies and insights to help your company be more efficient, more competitive, and more profitable in the marketplace.

    This exciting and dynamic conference will feature a combination of technical breakout sessions, general session guest speakers, and ample opportunities for networking.

    Why Attend?

    Since 2003, Chevron Reliability Maintenance Conference (RMC) has been holding the premier technical summit in the US for heavy-duty equipment industries, including mining, construction, quarry and cement. Seeing how successful it has been, we started our 1st Asia Pacific edition last year in Indonesia & Thailand.

    It is our goal, that you receive not only actionable ideas and best practices to take back to the office or worksite, but the opportunity to share your experiences with peers and our industry experts.

    So, don’t miss this exclusive (by invite only) opportunity to help you gain useful knowledge to run more efficiently.

    Benefits You Get

    • Network and expand industry professional relationships from around the world
    • Develop powerful connections – peer-to-peer interaction
    • Learn about future trends
    • Improve your plant’s reliability and maintenance practices
    • Discover solutions that you can implement

    Who Should Attend?

    Attendees will be made up of Owners, Technical Managers, Engineers, Facility Managers and Maintenance Reliability Plant Managers.

    SAVE the Date & See you soon!

     16 & 17 October 2019 in Kuala Lumpur, Malaysia

    More details will be revealed later.